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November 29, 2007
New Stepper Reduces Costs for Sub-Critical Layers Belmont, California – November 29, 2007 – Nikon continues its focus on high productivity lithography solutions with the introduction of the NSR-SF155, a scan field i-line stepper with ultra-high throughput and the lowest cost of ownership. Throughput has been increased to 200 wafers per hour or more, with overlay...
Belmont, California – November 29, 2007 – Nikon Corporation has completed shipment of its NSR-S610C ArF immersion scanners to all of the five major regions of the world where leading-edge devices are manufactured. These areas include Japan, Taiwan, Korea, North America, and Europe. Immersion customers include memory and logic manufacturers, consisting of both existing Nikon equipment...